Nanoimprint Lithography (NIL) is a nanoscale fabrication technique in which patterns are transferred from a pre-fabricated mold into a deformable resist through direct mechanical contact. The ...

Initially, NIL was used for flash-curing polymer precursors and embossing thermoplastic resists. However, as the demand for high-density material architectures in the semiconductor industry grew, new ...

Nanoimprint lithography (NIL) is re-emerging amid an explosion of new applications in the market. Canon, EV Group, Nanonex, Suss and others continue to develop and ship NIL systems for a range of ...

Nanoimprint lithography, which for decades has trailed behind traditional optical lithography, is emerging as the technology of choice for the rapidly growing photonics and biotech chips markets.

In recent years, considerable attention has been paid to the trend toward miniaturization of LEDs, driven by display devices, augmented reality, virtual reality, and other emerging technologies. Due ...

In what should be good news for integrated circuit manufacturers, recent studies by the National Institute of Standards and Technology (NIST) have helped resolve two important questions about an ...

A heat-resistant titanium dioxide scaffold makes it possible to nanoimprint reconfigurable phase-change metasurfaces over large areas, achieving infrared modulation and switchable chirality. (Nanowerk ...

Forward-looking: Canon is renowned for its printers, cameras, and other imaging products designed for both consumer and industrial use. The Japanese company is now applying its extensive knowledge in ...