Concept of mask/wafer co-optimization by moving the shot with mask and wafer double simulation to minimize wafer error. VSB shot configurations and its corresponding ...

New research paper entitled “Plasma-based area selective deposition for extreme ultraviolet resist defectivity reduction and process window improvement” from TEL Technology Center, Americas and IBM ...

One of the main challenges in developing semiconductor chip technology is making electronic components smaller and more effective. This difficulty is most noticeable in lithography, which is the ...

Initially, NIL was used for flash-curing polymer precursors and embossing thermoplastic resists. However, as the demand for high-density material architectures in the semiconductor industry grew, new ...

Nanoimprint lithography (NIL) is an advanced nanofabrication technique capable of creating patterns and structures smaller than 10 nm with low cost, high throughput ...