An extremely large exposure field with fine resolution technology on a 515 mm x 510 mm panel is demonstrated — a new technology that will address the challenges of large package size processes.

A new technical paper titled “Statistics of EUV exposed nanopatterns: Photons to molecular dissolutions” was published by Hiroshi Fukuda, Hitachi High-Tech Corporation. “For higher computing power of ...

TOKYO--(BUSINESS WIRE)--Dai Nippon Printing Co., Ltd. (DNP, TOKYO: 7912) has successfully achieved the fine pattern resolution required for photomasks for logic semiconductors of the beyond 2nm (nm: ...

How Does EUV Lithography Work? EUV Lithography is a state-of-the-art technology in chip manufacturing that uses highly energetic ultraviolet light to carve detailed patterns onto semiconductor ...

Complexity And Cost: X-ray sources and masks are expensive and require specialised facilities, making the overall process costly. Proximity Printing: The need for proximity between the mask and resist ...

Fig. 1 | Metalens-based DLW lithography. Schematic diagrams of (a) the DLW lithography setup, (b) the metalens and its constructing unit cells. (c) The metalens in top view and cross-section view. (d) ...

2019 marked an important milestone for extreme ultraviolet (EUV) lithography. In that year, the EUV patterning technology was for the first time deployed for the mass production of logic chips of the ...