EDN

Novellus debuts CMP tool for 65-nm and below ICs

SAN JOSE, Calif. — Novellus Systems Inc. moved to lower the cost of chemical mechanical planarization (CMP) Monday (June 21) by rolling out a 300-mm tool that it claimed could be used down to the ...
EDN

Applied, Ebara, Novellus to debut low-cost CMP tools

SAN JOSE, Calif.–Responding to an outcry over the soaring cost of chemical mechanical polishing (CMP) technology, several chip-equipment vendors are readying new tools that are said to bring down the ...
Semiconductor Engineering

Reducing Rework In CMP: An Enhanced Machine Learning-Based Hybrid Metrology Approach

The semiconductor industry is constantly marching toward thinner films and complex geometries with smaller dimensions, as well as newer materials. The number of chemical mechanical planarization (CMP) ...
Silicon Semiconductor

Preventing liquid cross-contamination in semiconductor manufacturing

Producing high-purity wafers via the CMP process is a critical application and the halting of harmful slurry-DIW ...
Business Wire

Quartz Unlimited LLC. Announcing the Availability of Quartz Wafers for CMP Tools for Applied Materials Mirra, Mirra Mesa and Reflexion Family of Machines

BOCA RATON, Fla.--(BUSINESS WIRE)--June 28, 2005--Quartz Unlimited LLC. is offering a cost saving alternative of using reclaimed TEOS or thermal oxide dummy wafers for CMP(a) tools retaining ring ...